Collison, Wenli : rechercher sur Z-Library

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1

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Design and performance of a step and repeat imprinting machine

McMackin, Ian, Schumaker, Philip, Babbs, Daniel, Choi, Jin, Collison, Wenli, Sreenivasan, S. V., Schumaker, Norman E., Watts, Michael P. C., Voisin, Ronald D., Engelstad, Roxann L.

Année:

2003

Langue:

english

Fichier:

PDF, 833 KB

english, 2003

2

On the Development of 1700V SiC JBS Diodes in a 6-Inch Foundry

Yun, Nick, Liu, Eric, Sung, Woong Je, Larrea, Anne Sophie, Franca, Daniel, Gorczyca, Thomas, Bialy, Alexander, Collison, Wen Li, Prudhomme, Jamie, Hung, Pui Yee, Valente, Sean, Dunn, Shannon, Sapp, Br

Journal:

Materials Science Forum

Année:

2019

Fichier:

PDF, 2.00 MB

2019

3

Ion drag effects in inductively coupled plasmas for etching

Collison, Wenli Z., Kushner, Mark J.

Journal:

Applied Physics Letters

Année:

1996

Langue:

english

Fichier:

PDF, 390 KB

english, 1996

4

A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments

Kushner, Mark J., Collison, Wenli Z., Grapperhaus, Michael J., Holland, John P., Barnes, Michael S.

Journal:

Journal of Applied Physics

Année:

1996

Langue:

english

Fichier:

PDF, 473 KB

english, 1996

5

Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe

Collison, Wenli Z.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Année:

1998

Langue:

english

Fichier:

PDF, 453 KB

english, 1998

6

[IEEE 2013 IEEE International Electron Devices Meeting (IEDM) - Washington, DC, USA (2013.12.9-2013.12.11)] 2013 IEEE International Electron Devices Meeting - Opportunities and challenges of the 450mm transition

Lin, John, Lin, Pinyen, Ku, Wen-Yu, Kelling, Mark C., Akiki, Greg, Kwon, Sangdong, Lee, Kwangwook, Collison, Wenli, Chang, Stock, Cottle, Rand, Wang, Yu-Chih, Borst, Christopher, Skilbred, David, Robe

Année:

2013

Langue:

english

Fichier:

PDF, 2.15 MB

english, 2013

7

HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy

Chou, Shang-I, Baer, Douglas S., Hanson, Ronald K., Collison, Wenli Z., Ni, Tom Q.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Année:

2001

Langue:

english

Fichier:

PDF, 542 KB

english, 2001

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advanced Etch Technology for Nanopatterning V - 450mm etch process development and process chamber evaluation using 193i DSA guided pattern

Lin, Qinghuang, Engelmann, Sebastian U., Collison, Wenli, Lin, Yii-Cheng, Dunn, Shannon, Takikawa, Hiroaki, Paris, James, Chen, Lucy, Detrick, Troy, Belen, Jun, Stojakovic, George, Goss, Michael, Fish

Année:

2016

Langue:

english

Fichier:

PDF, 1.59 MB

english, 2016

9

[IEEE 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2016.5.16-2016.5.19)] 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - STI 28nm pitch guided DSA to enable the 450mm tools qualification and transition

Larrea, Anne-Sophie, Dunn, Shannon, Collison, Wenli, Franca, Daniel, Borst, Christopher, Lee, Janghee, Lim, JongHeun J H, Chang, Stock

Année:

2016

Langue:

english

Fichier:

PDF, 745 KB

english, 2016

10

Safety and Proof-of-Concept Study of Oral QLT091001 in Retinitis Pigmentosa Due to Inherited Deficiencies of Retinal Pigment Epithelial 65 Protein (RPE65) or Lecithin:Retinol Acyltransferase (LRAT)

Scholl, Hendrik P. N., Moore, Anthony T., Koenekoop, Robert K., Wen, Yuquan, Fishman, Gerald A., van den Born, L. Ingeborgh, Bittner, Ava, Bowles, Kristen, Fletcher, Emily C., Collison, Frederick T.,

Journal:

Année:

2015

Langue:

english

Fichier:

PDF, 4.29 MB

english, 2015